• DocumentCode
    3619555
  • Title

    Influence of Doping Profile and Halo Implantation on the Threshold Voltage Mismatch of a 0.13um CMOS Technology

  • Author

    J.A. Croon;E. Augendre;S. Decoutere;W. Sansen;H.E. Maes

  • Author_Institution
    IMEC, Belgium and KU Leuven, Belgium
  • fYear
    2002
  • fDate
    6/24/1905 12:00:00 AM
  • Firstpage
    579
  • Lastpage
    582
  • Keywords
    "CMOS technology","Doping profiles","Threshold voltage","Fluctuations","Implants","Permittivity","Poisson equations","Statistics","Capacitance","Degradation"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
  • Print_ISBN
    88-900847-8-2
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2002.194997
  • Filename
    1503927
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619555