• DocumentCode
    3619556
  • Title

    Impact of ALCVD and PVD Titanium Nitride Deposition on Metal Gate Capacitors

  • Author

    G. Lujan;T. Schram;L. Pantisano;J. Hooker;S. Kubicek;E. Rohr;J. Schuhmacher;O. Kilpela;H. Sprey;S. De Gendt;K. De Meyer

  • Author_Institution
    IMEC, Leuven, Belgium
  • fYear
    2002
  • fDate
    6/24/1905 12:00:00 AM
  • Firstpage
    583
  • Lastpage
    586
  • Keywords
    "Atherosclerosis","Titanium","Capacitors","Tin","Electrodes","High-K gate dielectrics","Data mining","Capacitance measurement","High K dielectric materials","Chemical vapor deposition"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
  • Print_ISBN
    88-900847-8-2
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2002.194998
  • Filename
    1503928
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619556