DocumentCode :
3619557
Title :
Stability of High-k Thin Films in Moisture Ambience - The Effect of Dissolution Gas from Acryl Apparatus -
Author :
S. Akama;A. Kikuchi;J. Tonotani;S.-I. Ohmi;H. Iwai
Author_Institution :
Tokyo Institute of Technology, Japan
fYear :
2002
fDate :
6/24/1905 12:00:00 AM
Firstpage :
587
Lastpage :
590
Keywords :
"Stability","High K dielectric materials","High-K gate dielectrics","Transistors","Moisture","Testing","Absorption","Degradation","Leakage current","Electrodes"
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
Type :
conf
DOI :
10.1109/ESSDERC.2002.194999
Filename :
1503929
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3619557
