DocumentCode :
3619568
Title :
Effects of Stress-Induced Bandgap Narrowing on Reverse-Bias Junction Behavior
Author :
V. Gopinath;V. Palankovski;S. Aronowitz;S. Selberherr
Author_Institution :
LSI Logic Corporation, Santa Clara, CA, USA
fYear :
2002
fDate :
6/24/1905 12:00:00 AM
Firstpage :
631
Lastpage :
634
Keywords :
"Photonic band gap","Stress","Capacitance","Oxidation","Leakage current","Voltage","Isolation technology","Large scale integration","Logic","Microelectronics"
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
Type :
conf
DOI :
10.1109/ESSDERC.2002.195010
Filename :
1503940
Link To Document :
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