Title :
Effects of Stress-Induced Bandgap Narrowing on Reverse-Bias Junction Behavior
Author :
V. Gopinath;V. Palankovski;S. Aronowitz;S. Selberherr
Author_Institution :
LSI Logic Corporation, Santa Clara, CA, USA
fDate :
6/24/1905 12:00:00 AM
Keywords :
"Photonic band gap","Stress","Capacitance","Oxidation","Leakage current","Voltage","Isolation technology","Large scale integration","Logic","Microelectronics"
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
DOI :
10.1109/ESSDERC.2002.195010