Recent developments on formation of ordered aluminum oxide films for photonic crystals application

The latest results on fabrication of ordered aluminum oxide nanopore arrays with interpore distance of submicrometer and micrometer scale - prerequisites for two dimensional photonic crystals - formed by prepatterning via interference lithography and subsequent electrochemical anodization are presented. Two illustrative samples of the range of 700-800 nm and 1.5 /spl mu/m were analysed. The view of prepatterned surface together with the bottom view revealed formation of perfectly ordered structure of aluminum oxide. In comparison to our successful former method via two-step imprint by gratings, the technique of interference lithography developed in this work demonstrated less qualitative results.