• DocumentCode
    3619662
  • Title

    Control gate patterning optimisation for improved yield of 0.18um embedded FLASH technology

  • Author

    M. Hendriks;E. Gerritsen;D. Dormans

  • Author_Institution
    Philips Semiconductors, Nijmegen, The Netherlands
  • fYear
    2001
  • fDate
    6/23/1905 12:00:00 AM
  • Firstpage
    387
  • Lastpage
    390
  • Keywords
    "Etching","Character generation","Nonvolatile memory","Fabrication","Isolation technology","Manufacturing","Size control","Low voltage","Dielectrics","Iron"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2001. Proceeding of the 31st European
  • Print_ISBN
    2-914601-01-8
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2001.195282
  • Filename
    1506664
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619662