DocumentCode :
3619665
Title :
ILD Development for Embedded 0.18um FLASH Technology
Author :
A. Cacciato;G. van de Ven;P. Habas;M. de Keijser;C. Deuper;X.M. Zhang;D. Dormans;R. Verhaar
Author_Institution :
Philips Semiconductors, Nijmegen, The Netherlands
fYear :
2001
fDate :
6/23/1905 12:00:00 AM
Firstpage :
435
Lastpage :
438
Keywords :
"Character generation","Plasma materials processing","Plasma measurements","Current measurement","Materials reliability","Materials testing","Stress measurement","Plasma chemistry","Chemical vapor deposition","CMOS logic circuits"
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
Type :
conf
DOI :
10.1109/ESSDERC.2001.195294
Filename :
1506676
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3619665
