• DocumentCode
    3621240
  • Title

    Nanoimprint lithography for RF SAW manufacture

  • Author

    Wen Liu

  • Volume
    2
  • fYear
    2005
  • fDate
    6/27/1905 12:00:00 AM
  • Firstpage
    1303
  • Lastpage
    1306
  • Keywords
    "Nanolithography","Radio frequency","Surface acoustic waves","Resists","Optical surface waves","Substrates","Manufacturing industries","Semiconductor device manufacture","Integrated circuit technology","Nonhomogeneous media"
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium, 2005 IEEE
  • ISSN
    1051-0117
  • Print_ISBN
    0-7803-9382-1
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2005.1603092
  • Filename
    1603092
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3621240