DocumentCode :
3621240
Title :
Nanoimprint lithography for RF SAW manufacture
Author :
Wen Liu
Volume :
2
fYear :
2005
fDate :
6/27/1905 12:00:00 AM
Firstpage :
1303
Lastpage :
1306
Keywords :
"Nanolithography","Radio frequency","Surface acoustic waves","Resists","Optical surface waves","Substrates","Manufacturing industries","Semiconductor device manufacture","Integrated circuit technology","Nonhomogeneous media"
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium, 2005 IEEE
ISSN :
1051-0117
Print_ISBN :
0-7803-9382-1
Type :
conf
DOI :
10.1109/ULTSYM.2005.1603092
Filename :
1603092
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3621240