3621533

CMOS devices mobility enhancement and low resistance source/drain

F. Boeuf; Huiling Shang

2005

6/27/1905 12:00:00 AM

128

128

"Ballistic transport","Silicon germanium","Germanium silicon alloys","Contact resistance","Microelectronics","Electrical resistance measurement","Electron mobility","High K dielectric materials","High-K gate dielectrics","Paper technology"

ieee

Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International

0-7803-9268-X

conf

10.1109/IEDM.2005.1609285

1609285