مرکز منطقه ای اطلاع رساني علوم و فناوري

DocumentCode :

3621659

Title :

Ultra low temperature NISI processing

Author :

A. Hunter;C. Tanasa;R. Ramanujam;A. Tang;N. Tam;B. Ramachandran;R. Achutharaman;S. Ramamurthy;J. Ranish

Author_Institution :

Applied Materials Inc., Santa Clara, California 95054

fYear :

2005

fDate :

6/27/1905 12:00:00 AM

Firstpage :

175

Lastpage :

175

Abstract :

Manuscript not released forpublication due to legal issues.

Keywords :

Temperature

Publisher :

ieee

Conference_Titel :

Advanced Thermal Processing of Semiconductors, 2005. RTP 2005. 13th IEEE International Conference on

Print_ISBN :

0-7803-9223-X

Type :

conf

DOI :

10.1109/RTP.2005.1613705

Filename :

1613705

Link To Document :