DocumentCode :
3623192
Title :
Series resistance and effective gate length extraction on short-channel PMOS devices at liquid nitrogen temperature
Author :
F.J. Garcia Sanchez;A. Ortiz-Conde;M. Garcia Nunez;R.L. Anderson
Author_Institution :
Dept. de Electron., Simon Bolivar Univ., Caracas, Venezuela
fYear :
1994
Firstpage :
190
Lastpage :
194
Abstract :
A simple method is presented which allows to extract the effective channel length and the gate voltage dependent series resistance of p-channel MOSFETs at low temperature. The method is used on devices with mask channel lengths from 0.6 to 2.0 /spl mu/m, operating at room and at liquid nitrogen temperatures, and it is compared with conventional methods. The series resistance decreases and the effective channel length increases in these devices when the temperature is lowered from 300 to 77 K.
Keywords :
"MOS devices","Nitrogen","Temperature dependence","MOSFETs","Surface resistance","Threshold voltage","Laboratories","Semiconductor device modeling","Parameter extraction","Subthreshold current"
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1994. ICMTS 1994. Proceedings of the 1994 International Conference on
Print_ISBN :
0-7803-1757-2
Type :
conf
DOI :
10.1109/ICMTS.1994.303478
Filename :
303478
Link To Document :
بازگشت