DocumentCode :
3629684
Title :
Influence of geometrical parameters of mutual parallel paths on process of disturbances propagation
Author :
Wlodzimierz Kalita;Wieslaw Sabat;Dariusz Klepacki;Kazimierz Kamuda
Author_Institution :
Rzeszow University of Technology, Dept. of Electronic and Communication Systems, W.Pola 2, 35-959, Poland
fYear :
2008
Firstpage :
1091
Lastpage :
1096
Abstract :
The problems connected with electromagnetic couplings between mutual parallel paths in planar structures made in thick-film technology have been presented in the paper. The influence of geometrical configuration of thick-film path systems on shape of transfer function between them has been analyzed. The modification of transfer function under changes of the particular geometrical factors has been quantitatively determined using elaborated computer programs. The results of calculations have been presented for the selected path configurations.
Keywords :
"Circuits","Transfer functions","Capacitance","Inductance","Crosstalk","Electromagnetic propagation","Paper technology","Microelectronics","Conducting materials","Dielectric substrates"
Publisher :
ieee
Conference_Titel :
Electronics System-Integration Technology Conference, 2008. ESTC 2008. 2nd
Print_ISBN :
978-1-4244-2813-7
Type :
conf
DOI :
10.1109/ESTC.2008.4684503
Filename :
4684503
Link To Document :
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