Title :
Plasma metallization textiles as shields for electromagnetic fields
Author :
Joanna Koprowska;Jan Ziaja;Jaroslaw Janukiewicz
Author_Institution :
Textile Research Institute, Brzezi?ska 5/15 , 92-103 ??d?, Poland
Abstract :
The aim of this paper is electromagnetic testing of innovative shielding textiles in the frequency range from 30 MHz up to 1300 MHz. These new materials were obtained using plasma metallization process. The metallic film was deposited by magnetron sputtering in argon atmosphere from Zn-target on the polypropylene (PP) nonwovens. The microstructure of Zn-films was studied by scanning microscopy (SEM). Obtained metallic layers were characterized by good adhesion to PP and shielding effectiveness (SE) over 50 dB. It was indicated that 3D structure of the textile surface influences the value of SE.
Keywords :
"Metallization","Textiles","Electromagnetic fields","Plasma materials processing","Scanning electron microscopy","Electromagnetic shielding","Testing","Frequency","Inorganic materials","Magnetic materials"
Conference_Titel :
Electromagnetic Compatibility - EMC Europe, 2008 International Symposium on
Electronic_ISBN :
2325-0364
DOI :
10.1109/EMCEUROPE.2008.4786933
