• DocumentCode
    3631454
  • Title

    Piezoelectric ZnO thin films prepared by cyclic sputtering and etching technology

  • Author

    I. Novotny;P. Sutta;F. Mika;V. Tvarozek

  • Author_Institution
    Dept. of Microelectron., Slovak Tech. Univ., Bratislava, Slovakia
  • Volume
    1
  • fYear
    1995
  • Firstpage
    65
  • Abstract
    A novel procedure of ion assisted deposition technology consisting of cyclic sputtering and ion etching is presented. Cross-resistivities of ZnO films deposited by that technique increased up to 10/sup 10/ /spl Omega/cm due to the formation of buffer regions in the films. These ZnO films with the piezoelectric coefficient of the order of 10/sup -12/ m/V are applicable in low-frequency microactuators.
  • Keywords
    "Sputtering","Zinc oxide","Piezoelectric films","Sputter etching","Substrates","Conductivity","Semiconductor films","Conductive films","Argon","Voltage"
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics, 1995. Proceedings., 1995 20th International Conference on
  • Print_ISBN
    0-7803-2786-1
  • Type

    conf

  • DOI
    10.1109/ICMEL.1995.500836
  • Filename
    500836
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3631454