DocumentCode :
3632852
Title :
Evaluation of cleaning in electronics production process
Author :
Martin Bursik;Ivan Szendiuch;Vladimir Sitko
Author_Institution :
Brno University of Technology, Faculty of Electrical Engineering and Communication, Department of Microelectronics, 602 00, ?doln? 53, Czech Republic
fYear :
2009
fDate :
5/1/2009 12:00:00 AM
Firstpage :
1
Lastpage :
4
Abstract :
Cleaning processes used in electronics productions are limited by cleaning efficiency. Those according to physical principle particular cleaning processes limits the area of application of existing system. At the selection of cleaning equipment is very important specification of their efficiency. For this purpose we have developed the quantifiable analyze of contaminated patterns. Evaluating is realized by test pattern on which are applied cleaning processes with different parameters. Next operation is visual controlling of residual contamination. In this way we are capable to determinate the average efficiency of cleaning system, specific efficiency on concrete test pattern and the homogeneity of cleaning efficiency in cleaning chamber. Important for cleaning process is an activity of cleaning medium. The activity of cleaning medium must be over minimum limits. Time intervals are set constant by the parameters of cleaning process especially its activity. For this reason is useful online monitoring of cleaning medium efficiency. This method requires universal sensor of medium activity.
Keywords :
"Cleaning","Production","Contamination","Monitoring","System testing","Glass","Concrete","Pollution measurement","Semiconductor device measurement","Microelectronics"
Publisher :
ieee
Conference_Titel :
Electronics Technology, 2009. ISSE 2009. 32nd International Spring Seminar on
ISSN :
2161-2528
Print_ISBN :
978-1-4244-4260-7
Electronic_ISBN :
2161-2064
Type :
conf
DOI :
10.1109/ISSE.2009.5207064
Filename :
5207064
Link To Document :
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