Mathematically simulated process of evaporation of thin NiCr films

Process of evaporation of thin NiCr resistive films on glass substrates has been simulated using DOE. The resistance of evaporated films has been calculated using a mathematical model based on three technological factors: the temperature of the substrate, the pressure and the time of evaporation. The model has been found using factorial experiments of the type 2³. It has been found very good correspondence between the resistance values calculated using the model and found experimentally.