DocumentCode :
3635145
Title :
A 6 device SOI new technology for mixed analog-digital and rad-hard applications
Author :
J.P. Blanc;J. Bonaime;E. Delevoye;J. de Pontcharra;J. Gautier;F. Martin;R. Truche
Author_Institution :
LETI, (CEA-Technologies avanc?es), DMEL, CENG, B.P. 85X, 38041 Grenoble Cedex, France
fYear :
1993
Firstpage :
679
Lastpage :
682
Abstract :
DMILL technology is being developed for very rad-hard analog-digital applications, such as space and military circuits or as electronics for the future generation of high energy collider (LHC, CERN, Geneva) [3]. Both CMOS and junction (JFET and bipolar) transistors arc needed. A new process has been integrated, based on a 1.2 μm thick silicon film on insulator (SIMOX plus epitaxy), a complete dielectric isolation and low temperature process. The main feature is that six different components are fabricated on the same wafer, taking into account the 12 volts supply voltage constraint for some analog applications. The first electrical characteristics are presented in this paper. The optimization capabilities of such an hardened CBi-CJ-CMOS technology are discussed.
Keywords :
"Analog-digital conversion","Radiation hardening","Space technology","CMOS technology","Silicon on insulator technology","Integrated circuit technology","Large Hadron Collider","Semiconductor films","Dielectrics and electrical insulation","Epitaxial growth"
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1993. ESSDERC ´93. 23rd European
Print_ISBN :
2-86332-135-8
Type :
conf
Filename :
5435587
Link To Document :
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