DocumentCode :
3635155
Title :
Formation of Buried Layers by Laser Radiation
Author :
A. Medvid;J. Kaupuzs
Author_Institution :
Riga Technical University, Riga LV-1658, LATVIA, Laboratory of Semiconductor Physics
fYear :
1995
Firstpage :
671
Lastpage :
674
Abstract :
New conception and both experimental anid theoretical results regarding buried layers formation and control of their depth anid thickness are presented. Effect of the CO2 laser radiation on distribution and state of oxygen or nitrogen atoms, implanted in silicon wafer, is investigated experimentally. A model is proposed and equations are obtained descrbing the process of buried layer´s foruation from impurities, introduced inside the crystal, in presence of the temperature gradient. An interaction between impurities is taken into account.
Keywords :
"Laser theory","Impurities","Thickness control","Atom lasers","Laser modes","Nitrogen","Atomic beams","Atomic layer deposition","Atomic measurements","Silicon"
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1995. ESSDERC ´95. Proceedings of the 25th European
Print_ISBN :
286332182X
Type :
conf
Filename :
5436087
Link To Document :
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