Title :
Recirculating planar magnetrons for HPM and millimeter-wave generation
Author :
Ronald M. Gilgenbach;Yue-Ying Lau;David M. French;Brad W. Hoff;Matthew Franzi;David Simon;W. Luginsland
Author_Institution :
Plasma, Pulsed Power and Microwave Lab, Nuclear, Engineering and Radiological Sciences Dept, University of Michigan, Ann Arbor, MI 48109-2104
Abstract :
The Recirculating Planar Magnetron (RPM) [1] represents a revolutionary new class of crossed-field device that combines the advantages of high-efficiency recirculating devices with those of planar devices: both large-area cathode (high current) and anode (improved thermal management). This provides capabilities for both high power microwave and high frequency millimeter wave generation. Two UM RPM embodiments are modeled and under design:
Keywords :
"Magnetrons","High power microwave generation","Thermal management","Magnetic fields","Cathodes","Anodes","Microwave devices","Frequency","Microwave generation","Power generation"
Conference_Titel :
Plasma Science, 2010 Abstracts IEEE International Conference on
Print_ISBN :
978-1-4244-5474-7
DOI :
10.1109/PLASMA.2010.5534065
