DocumentCode :
3637738
Title :
The equipment for measuring of concentration profiles using the spreading resistance method
Author :
J. Hybler;V. Svagr
Author_Institution :
Czech Tech. Univ., Prague, Czech Republic
Volume :
2
fYear :
1996
Firstpage :
339
Abstract :
The equipment for measuring of concentration profiles in semiconductor structures using the spreading resistance method has been developed. Device is designed for measuring local contact resistance in range from 1/spl Omega/ to 10M/spl Omega/ with high level of accuracy. Resistance is measured under conditions of dc constant current with measured contact voltage below 10 mV. The stepping of the sample holder and the measuring pin movement (down and up) and data collection and processing are fully controlled by the PC.
Keywords :
"Electrical resistance measurement","Conductivity","Contact resistance","Area measurement","Thickness measurement","Testing","Data processing"
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 1996., International
Print_ISBN :
0-7803-3223-7
Type :
conf
DOI :
10.1109/SMICND.1996.557390
Filename :
557390
Link To Document :
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