DocumentCode
3638175
Title
A theoretical study of effect of gate voltage on electron-modulated-acoustic-phonon interactions in silicon nanowire MOSFETs
Author
Junichi Hattori;Shigeyasu Uno;Nobuya Mori;Kazuo Nakazato
Author_Institution
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Aichi 464-8603, Japan
fYear
2010
Firstpage
93
Lastpage
96
Abstract
We theoretically investigate the gate voltage dependence of the interaction between modulated acoustic phonons and electrons in SiO2 -coated Si nanowires. The gate voltage decreases the form factor calculated with modulated acoustic phonons as well as that for bulk phonons. However, the relative difference between the two form factors, that is, the phonon modulation effect on the form factor becomes larger with increasing gate voltage. In addition, we evaluate the phonon modulation effect on the electron mobility in the Si nanowires, and reveal that the effect becomes smaller with increasing gate voltage.
Keywords
"Phonons","Acoustics","Scattering","Logic gates","Modulation","Silicon","Wave functions"
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
ISSN
1946-1569
Print_ISBN
978-1-4244-7701-2
Type
conf
DOI
10.1109/SISPAD.2010.5604562
Filename
5604562
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