• DocumentCode
    3638175
  • Title

    A theoretical study of effect of gate voltage on electron-modulated-acoustic-phonon interactions in silicon nanowire MOSFETs

  • Author

    Junichi Hattori;Shigeyasu Uno;Nobuya Mori;Kazuo Nakazato

  • Author_Institution
    Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Aichi 464-8603, Japan
  • fYear
    2010
  • Firstpage
    93
  • Lastpage
    96
  • Abstract
    We theoretically investigate the gate voltage dependence of the interaction between modulated acoustic phonons and electrons in SiO2-coated Si nanowires. The gate voltage decreases the form factor calculated with modulated acoustic phonons as well as that for bulk phonons. However, the relative difference between the two form factors, that is, the phonon modulation effect on the form factor becomes larger with increasing gate voltage. In addition, we evaluate the phonon modulation effect on the electron mobility in the Si nanowires, and reveal that the effect becomes smaller with increasing gate voltage.
  • Keywords
    "Phonons","Acoustics","Scattering","Logic gates","Modulation","Silicon","Wave functions"
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4244-7701-2
  • Type

    conf

  • DOI
    10.1109/SISPAD.2010.5604562
  • Filename
    5604562