• DocumentCode
    3639427
  • Title

    Patterning of nanometer structures by using direct-write e-beam lithography for the sensor development

  • Author

    P. Ďurina;M. Štefečka;T. Roch;J. Noskovič;M. Trgala;A. Pidík;I. Kostič;A. Konečniková;L. Matay;P. Kúš; Plecenik

  • Author_Institution
    Department of Experimental Physics, FMFI UK, Mlynská
  • fYear
    2010
  • Firstpage
    89
  • Lastpage
    92
  • Abstract
    In this work, the optimalisation of e-beam parameters and the writing strategy have been performed. Various positive and negative e-beam resists have been evaluated for high resolution e-beam lithography and pattern transfer. Both, lift-off method and ion beam etching have been investigated for the pattern transfer into thin Pt and MoC layer on saphire substrate.
  • Keywords
    "Etching","Resists","Substrates","Ion beams","Lithography","Scanning electron microscopy","Gas detectors"
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Devices & Microsystems (ASDAM), 2010 8th International Conference on
  • Print_ISBN
    978-1-4244-8574-1
  • Type

    conf

  • DOI
    10.1109/ASDAM.2010.5666342
  • Filename
    5666342
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3639427