DocumentCode
3640089
Title
Conductance properties of as-grown and annealed MBE GaAs layers grown at temperatures between 200 and 420/spl deg/C
Author
P. Kordos;J. Betko;M. Morvic;J. Novak;A. Forster
Author_Institution
Inst. of Thin Film & Ion Technol., Res. Centre Julich, Germany
fYear
1996
Firstpage
37
Lastpage
40
Abstract
Precise temperature dependent conductivity measurements are carried out and the room temperature band and hopping components of the conductivity are determined for as-grown and annealed (590/spl deg/C, 10 min) MBE GaAs layers grown at various temperatures between 200 and 420/spl deg/C. It is found that the hopping conductivity strongly decreases and the band conductivity slightly changes with increasing growth temperature. The /spl sigma//sub hop/ to /spl sigma//sub band/ ratio decreases from 1/spl times/10/sup 6/ to 2/spl times/10/sup -2/ in as-grown layers and from 2/spl times/10/sup 2/ to 2/spl times/10/sup -3/ in annealed layers with increased growth temperature from 200 to 420/spl deg/C. The band and hopping components are comparable for unannealed layer grown at 400/spl deg/C and annealed layer grown at 350/spl deg/C. Layers grown at <350/spl deg/C are lattice mismatched in as-grown state. Further it is found that layers with dominating hopping show different electrical breakdown properties than layers with dominating band conductance.
Keywords
"Annealing","Gallium arsenide","Temperature dependence","Molecular beam epitaxial growth","Conductivity measurement","Lattices","Electric breakdown","Substrates","Temperature measurement","Temperature distribution"
Publisher
ieee
Conference_Titel
Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
Print_ISBN
0-7803-3179-6
Type
conf
DOI
10.1109/SIM.1996.570872
Filename
570872
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