• DocumentCode
    3640089
  • Title

    Conductance properties of as-grown and annealed MBE GaAs layers grown at temperatures between 200 and 420/spl deg/C

  • Author

    P. Kordos;J. Betko;M. Morvic;J. Novak;A. Forster

  • Author_Institution
    Inst. of Thin Film & Ion Technol., Res. Centre Julich, Germany
  • fYear
    1996
  • Firstpage
    37
  • Lastpage
    40
  • Abstract
    Precise temperature dependent conductivity measurements are carried out and the room temperature band and hopping components of the conductivity are determined for as-grown and annealed (590/spl deg/C, 10 min) MBE GaAs layers grown at various temperatures between 200 and 420/spl deg/C. It is found that the hopping conductivity strongly decreases and the band conductivity slightly changes with increasing growth temperature. The /spl sigma//sub hop/ to /spl sigma//sub band/ ratio decreases from 1/spl times/10/sup 6/ to 2/spl times/10/sup -2/ in as-grown layers and from 2/spl times/10/sup 2/ to 2/spl times/10/sup -3/ in annealed layers with increased growth temperature from 200 to 420/spl deg/C. The band and hopping components are comparable for unannealed layer grown at 400/spl deg/C and annealed layer grown at 350/spl deg/C. Layers grown at <350/spl deg/C are lattice mismatched in as-grown state. Further it is found that layers with dominating hopping show different electrical breakdown properties than layers with dominating band conductance.
  • Keywords
    "Annealing","Gallium arsenide","Temperature dependence","Molecular beam epitaxial growth","Conductivity measurement","Lattices","Electric breakdown","Substrates","Temperature measurement","Temperature distribution"
  • Publisher
    ieee
  • Conference_Titel
    Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
  • Print_ISBN
    0-7803-3179-6
  • Type

    conf

  • DOI
    10.1109/SIM.1996.570872
  • Filename
    570872