DocumentCode
3640090
Title
Annealing characteristics of native defects in low-temperature-grown MBE GaAs
Author
J. Darmo;F. Dubecky;P. Kordos;A. Forster
Author_Institution
Inst. of Electr. Eng., Slovak Acad. of Sci., Bratislava, Slovakia
fYear
1996
Firstpage
67
Lastpage
70
Abstract
Deep-level states in low-temperature-grown MBE GaAs are analyzed from the viewpoint of thermal stability. Gallium vacancy V/sub Ga/-related states have two annealing stages with the on-set temperature at about 310 and 430/spl deg/C. Low temperature stage is connected with mobile arsenic interstitial A/sub Si/, while an interaction between V/sub Ga/ and arsenic antiside As/sub Ga/ is dominant in the later stage. Essential annealing kinetic characteristics were determined for both stages. Finally, the migration enthalpy for As/sub Ga/ and the formation enthalpy of annealing of the EL6 state were estimated.
Keywords
"Annealing","Gallium arsenide","Molecular beam epitaxial growth","Kinetic theory","Temperature measurement","Admittance","Spectroscopy","Transistors","Thermal engineering","Stability analysis"
Publisher
ieee
Conference_Titel
Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
Print_ISBN
0-7803-3179-6
Type
conf
DOI
10.1109/SIM.1996.570880
Filename
570880
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