• DocumentCode
    3640090
  • Title

    Annealing characteristics of native defects in low-temperature-grown MBE GaAs

  • Author

    J. Darmo;F. Dubecky;P. Kordos;A. Forster

  • Author_Institution
    Inst. of Electr. Eng., Slovak Acad. of Sci., Bratislava, Slovakia
  • fYear
    1996
  • Firstpage
    67
  • Lastpage
    70
  • Abstract
    Deep-level states in low-temperature-grown MBE GaAs are analyzed from the viewpoint of thermal stability. Gallium vacancy V/sub Ga/-related states have two annealing stages with the on-set temperature at about 310 and 430/spl deg/C. Low temperature stage is connected with mobile arsenic interstitial A/sub Si/, while an interaction between V/sub Ga/ and arsenic antiside As/sub Ga/ is dominant in the later stage. Essential annealing kinetic characteristics were determined for both stages. Finally, the migration enthalpy for As/sub Ga/ and the formation enthalpy of annealing of the EL6 state were estimated.
  • Keywords
    "Annealing","Gallium arsenide","Molecular beam epitaxial growth","Kinetic theory","Temperature measurement","Admittance","Spectroscopy","Transistors","Thermal engineering","Stability analysis"
  • Publisher
    ieee
  • Conference_Titel
    Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
  • Print_ISBN
    0-7803-3179-6
  • Type

    conf

  • DOI
    10.1109/SIM.1996.570880
  • Filename
    570880