• DocumentCode
    3642203
  • Title

    Low-loss polysilicon waveguides suitable for integration within a high-volume electronics process

  • Author

    Jason S. Orcutt;Sanh D. Tang;Steve Kramer;Hanqing Li;Vladimir Stojanović;Rajeev J. Ram

  • Author_Institution
    Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139
  • fYear
    2011
  • fDate
    5/1/2011 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Polysilicon waveguides are fabricated in a 300 mm wafer process representative of a complete high-volume electronic memory process. 6.2 dB/cm end-of-line loss is measured for narrow waveguides with a confinement factor scaling of 5.1 cm-1.
  • Keywords
    "Optical waveguides","Propagation losses","Loss measurement","Optical losses","Materials","Surface roughness","Rough surfaces"
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2011 Conference on
  • Print_ISBN
    978-1-4577-1223-4
  • Type

    conf

  • DOI
    10.1364/CLEO_SI.2011.CThHH2
  • Filename
    5950452
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3642203