Preparation of shell nanocrystalline Ga-doped ZnO ultra-thin films by sputtering

In this paper the possibility to form ultra-thin homogenous films doped by Ga (ZnO:Ga) by continual or sequential sputtering is presented. An influence of post-deposition annealing on crystalline structure of films was studied. The ability to create a highly consistent coverage (shell) of three dimensional nanostructures (GaP nanowires) by the sequential mode of sputtering was proven.