DocumentCode :
36565
Title :
Improved Model for Increased Surface Recombination Current in Irradiated Bipolar Junction Transistors
Author :
Barnaby, H.J. ; Vermeire, B. ; Campola, M.J.
Author_Institution :
Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
Volume :
62
Issue :
4
fYear :
2015
fDate :
Aug. 2015
Firstpage :
1658
Lastpage :
1664
Abstract :
Current gain degradation in irradiated bipolar junction transistors is primarily due to excess base current caused by enhanced carrier recombination in the emitter-base space-charge region (SCR). Radiation-induced traps at the interface between silicon and the bipolar base oxide facilitate the recombination process primarily above the sensitive emitter-base junction. This leads to an increase in surface recombination current in the SCR, which is a non-ideal component of the BJT´s base current characteristic under active bias conditions. In this paper, we derive a precise analytical model for surface recombination current that captures bias dependencies typically omitted from traditional models. This improved model is validated by comparisons to these traditional approaches.
Keywords :
bipolar transistors; elemental semiconductors; radiation effects; semiconductor device models; silicon; space charge; surface recombination; BJT; SCR; Si; base current; bipolar base oxide; carrier recombination; current gain degradation; emitter-base space-charge region; irradiated bipolar junction transistors; radiation-induced traps; recombination process; sensitive emitter-base junction; silicon; surface recombination current; Current measurement; Integrated circuit modeling; Junctions; Mathematical model; Radiative recombination; Thyristors; Transistors; Base current; bipolar junction transistors; emitter-base junction; interface traps; radiation effects; recombination; space-charge;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2015.2452229
Filename :
7182367
Link To Document :
بازگشت