Title :
Threshold voltage and current variability of extremely narrow silicon nanowire MOSFETs with width down to 2nm
Author :
T. Mizutani;Y. Tanahashi;R. Suzuki;T. Saraya;M. Kobayashi;T. Hiramoto
Author_Institution :
Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
fDate :
6/1/2015 12:00:00 AM
Abstract :
The threshold voltage (VTH) and on-current (ION) variability of extremely narrow silicon nanowire channel FETs is intensively measured and statistically analyzed. It is found that the Pelgrom coefficient (AVT) of 7nm-wide nanowire FETs is much smaller than that of FDSOI FETs, while AVT rapidly increases as the nanowire width decreases down to 2nm. The increase in variability is ascribed to VTH fluctuations due to the quantum confinement effect induced by nanowire width fluctuations.
Keywords :
"Field effect transistors","Silicon","Potential well","Correlation","Fluctuations","Gaussian distribution","Very large scale integration"
Conference_Titel :
Silicon Nanoelectronics Workshop (SNW), 2015