DocumentCode :
3659166
Title :
Characterization of carrier dynamics in Ge quantum dots through Ge quantum-dot MOSFETs using pulsed voltage technique
Author :
Ming-Hao Kuo;Ho-Chane Chen;Wei-Ting Lai;Pei-Wen Li
Author_Institution :
Department of Electrical Engineering, National Central University, Chung Li, Taiwan, 320, Republic of China
fYear :
2015
fDate :
6/1/2015 12:00:00 AM
Firstpage :
1
Lastpage :
2
Abstract :
We demonstrated a novel CMOS approach for the fabrication of high-performance Ge quantum dot (QD) MOSFETs offering great promises as optical switches and transducers for Si-based optical interconnects. Measured photocurrent to dark current ratio (Iph/Idark) and photoresponsivities from the Ge QD PT were as high as 272,000 and 1.7 A/W, respectively, under incident power of 20 μW at 980 nm illumination. Carrier dynamics in Ge QDs were characterized by applying a depleting voltage pulse to the gate of MOSFET and by time-resolved photoluminescence on Ge QD array.
Keywords :
"MOSFET","Lighting","Silicon","Logic gates","Current measurement","Substrates","Oxidation"
Publisher :
ieee
Conference_Titel :
Silicon Nanoelectronics Workshop (SNW), 2015
Type :
conf
Filename :
7275300
Link To Document :
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