• DocumentCode
    3664802
  • Title

    AES analysis of interdiffusions in Cr/Au, Ti/Au and TiW/Au multi-layer films

  • Author

    Jun He;Fang Yang;Wei Wang;Li Zhang;Rui Li;Dacheng Zhang

  • Author_Institution
    National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing, P. R. China
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    668
  • Lastpage
    671
  • Abstract
    To predict the reliability of gold electrode, interdiffusions in Cr/Au, Ti/Au and TiW/Au multi-layers when thermally treated were investigated by depth profiling of auger electron spectroscopy (AES). The primitive measuring results suggest that all the under-layer metals diffuse in gold layer when thermally treated and the rise of temperature enhances these diffusions. Cr and Ti accumulate at the surface of gold layer in Cr/Au and Ti/Au samples. And it seems that the introduction of W prevents these accumulations in TiW/Au sample. The measurement of nanohardness indicates that the interdiffusion of under-layer metals increase the nanohardness, while annealing decreases the nanohardness of metal films.
  • Keywords
    "Conferences","Electron devices","Solid state circuits","Three-dimensional displays","Decision support systems"
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits (EDSSC), 2015 IEEE International Conference on
  • Print_ISBN
    978-1-4799-8362-9
  • Type

    conf

  • DOI
    10.1109/EDSSC.2015.7285204
  • Filename
    7285204