DocumentCode
3664802
Title
AES analysis of interdiffusions in Cr/Au, Ti/Au and TiW/Au multi-layer films
Author
Jun He;Fang Yang;Wei Wang;Li Zhang;Rui Li;Dacheng Zhang
Author_Institution
National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing, P. R. China
fYear
2015
fDate
6/1/2015 12:00:00 AM
Firstpage
668
Lastpage
671
Abstract
To predict the reliability of gold electrode, interdiffusions in Cr/Au, Ti/Au and TiW/Au multi-layers when thermally treated were investigated by depth profiling of auger electron spectroscopy (AES). The primitive measuring results suggest that all the under-layer metals diffuse in gold layer when thermally treated and the rise of temperature enhances these diffusions. Cr and Ti accumulate at the surface of gold layer in Cr/Au and Ti/Au samples. And it seems that the introduction of W prevents these accumulations in TiW/Au sample. The measurement of nanohardness indicates that the interdiffusion of under-layer metals increase the nanohardness, while annealing decreases the nanohardness of metal films.
Keywords
"Conferences","Electron devices","Solid state circuits","Three-dimensional displays","Decision support systems"
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits (EDSSC), 2015 IEEE International Conference on
Print_ISBN
978-1-4799-8362-9
Type
conf
DOI
10.1109/EDSSC.2015.7285204
Filename
7285204
Link To Document