• DocumentCode
    3666784
  • Title

    Electric field induced fabrication of nano dots, lines and pits with AFM

  • Author

    Deng-Hui Li;Zeng-Lei Liu;Ying Zhang;Nian-Dong Jiao;Lian-Qing Liu

  • Author_Institution
    Shenyang Jianzhu University, Shenyang, China
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    1143
  • Lastpage
    1148
  • Abstract
    This paper researched the electric field induced fabrication with atomic force microscope (AFM). Current-induced deposition rather than voltage-induced deposition is introduced. With this method, nano dots, lines and pits can be fabricated. Especially, the nano lines can be deposited continuously, rather than depositing a row of nano dots to form a nano line. This method is expected to be used as a nano welding technique, which can improve the physical and electrical connections between the various components of nano devices.
  • Keywords
    "Substrates","Electric fields","Nanobioscience","Surface treatment","Nanoscale devices","Nanostructures","Coatings"
  • Publisher
    ieee
  • Conference_Titel
    Cyber Technology in Automation, Control, and Intelligent Systems (CYBER), 2015 IEEE International Conference on
  • Print_ISBN
    978-1-4799-8728-3
  • Type

    conf

  • DOI
    10.1109/CYBER.2015.7288105
  • Filename
    7288105