Title :
Fabrication and evaluation of tunable submicron-thick monocrystalline silicon grating for integration on LSI circuit
Author :
T. Sasaki;S. Chernroj;H. Matsuura;K. Hane
Author_Institution :
Dept. of Nanomechanics, Tohoku University, Sendai, Japan
Abstract :
We present a fabrication process and characteristics of tunable submicron-thick monocrystalline silicon grating for integration of LSI wafer. The grating structure was successfully fabricated. The ribbon of the grating was successfully actuated. The rise time of step response was about 20 μs.
Keywords :
"Large scale integration","Gratings","Silicon","Substrates","Polymers","Fabrication","Electrodes"
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2015 International Conference on
Print_ISBN :
978-1-4673-6834-6
Electronic_ISBN :
2160-5041
DOI :
10.1109/OMN.2015.7288876
