DocumentCode
3667888
Title
Dielectric material for monolayer black phosphorus transistors: A first-principles investigation
Author
Qing Shi; Hong Guo; Fei Liu
Author_Institution
Department of Physics, McGill University, Montré
fYear
2015
Firstpage
56
Lastpage
59
Abstract
Using advanced parameter-free first-principles calculations, we suggested that corundum (a-Al2O3) is a promising candidate of the dielectric materials for monolayer black-phosphorus (BP). Hydrogen passivated Al2O3 is preferred to avoid metallization with monolayer BP. Clean interface is found between monolayer BP and H-terminated Al2O3. The valence-band offset for these systems is around 0.9eV, which is appropriate to create a reasonable carrier injection barrier. Moreover, orientation effect is found to be of great significance for these systems. Special orientation can generate an indirect band gap for monolayer BP.
Keywords
"Aluminum oxide","Charge transfer","Phosphorus","Atomic layer deposition","Dielectric materials","Chemicals","Transistors"
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN
1946-1569
Print_ISBN
978-1-4673-7858-1
Type
conf
DOI
10.1109/SISPAD.2015.7292257
Filename
7292257
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