• DocumentCode
    3667888
  • Title

    Dielectric material for monolayer black phosphorus transistors: A first-principles investigation

  • Author

    Qing Shi; Hong Guo; Fei Liu

  • Author_Institution
    Department of Physics, McGill University, Montré
  • fYear
    2015
  • Firstpage
    56
  • Lastpage
    59
  • Abstract
    Using advanced parameter-free first-principles calculations, we suggested that corundum (a-Al2O3) is a promising candidate of the dielectric materials for monolayer black-phosphorus (BP). Hydrogen passivated Al2O3 is preferred to avoid metallization with monolayer BP. Clean interface is found between monolayer BP and H-terminated Al2O3. The valence-band offset for these systems is around 0.9eV, which is appropriate to create a reasonable carrier injection barrier. Moreover, orientation effect is found to be of great significance for these systems. Special orientation can generate an indirect band gap for monolayer BP.
  • Keywords
    "Aluminum oxide","Charge transfer","Phosphorus","Atomic layer deposition","Dielectric materials","Chemicals","Transistors"
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4673-7858-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.2015.7292257
  • Filename
    7292257