• DocumentCode
    3667904
  • Title

    Advanced methodology for fast 3-D TCAD electrothermal simulation of power HEMTs including package

  • Author

    Aleš Chvála;Daniel Donoval;Marián Molnár;Juraj Marek;Patrik Príbytný

  • Author_Institution
    Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, 812 19, Slovakia
  • fYear
    2015
  • Firstpage
    116
  • Lastpage
    119
  • Abstract
    This paper introduces an advanced methodology for fast 3-D TCAD electrothermal simulation for the analysis of complex power devices including package and cooling assemblies. The proposed methodology is based on coupling a 3-D finite element method (FEM) thermal model of the package, 3-D FEM electrical model of the metallization layers and circuit electrical model using a mixed-mode setup in Synopsys TCAD Sentaurus environment. This approach combines the speed and accuracy, and couples temperature and current density nonuniformity in structure and metallization layers. A power InAlN/GaN high-electron mobility transistor (HEMT) is used to perform validation of the designed electrothermal simulation. The simulation results are compared with measured data and 2/3-D FEM simulations. The low time consuming simulation approach helps to optimize more complex power structures and systems including all main fabrication parameters from semiconductor layers, metallization, package, and up to cooling assemblies.
  • Keywords
    "Integrated circuit modeling","Solid modeling","HEMTs","MODFETs","Finite element analysis","Logic gates","Metallization"
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4673-7858-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.2015.7292272
  • Filename
    7292272