DocumentCode
3667904
Title
Advanced methodology for fast 3-D TCAD electrothermal simulation of power HEMTs including package
Author
Aleš Chvála;Daniel Donoval;Marián Molnár;Juraj Marek;Patrik Príbytný
Author_Institution
Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, 812 19, Slovakia
fYear
2015
Firstpage
116
Lastpage
119
Abstract
This paper introduces an advanced methodology for fast 3-D TCAD electrothermal simulation for the analysis of complex power devices including package and cooling assemblies. The proposed methodology is based on coupling a 3-D finite element method (FEM) thermal model of the package, 3-D FEM electrical model of the metallization layers and circuit electrical model using a mixed-mode setup in Synopsys TCAD Sentaurus environment. This approach combines the speed and accuracy, and couples temperature and current density nonuniformity in structure and metallization layers. A power InAlN/GaN high-electron mobility transistor (HEMT) is used to perform validation of the designed electrothermal simulation. The simulation results are compared with measured data and 2/3-D FEM simulations. The low time consuming simulation approach helps to optimize more complex power structures and systems including all main fabrication parameters from semiconductor layers, metallization, package, and up to cooling assemblies.
Keywords
"Integrated circuit modeling","Solid modeling","HEMTs","MODFETs","Finite element analysis","Logic gates","Metallization"
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN
1946-1569
Print_ISBN
978-1-4673-7858-1
Type
conf
DOI
10.1109/SISPAD.2015.7292272
Filename
7292272
Link To Document