DocumentCode :
3667938
Title :
FinFET to nanowire transition at 5nm design rules
Author :
Lee Smith; Munkang Choi;Martin Frey;Victor Moroz;Anne Ziegler;Mathieu Luisier
Author_Institution :
Synopsys, Inc., Mountain View, CA, USA
fYear :
2015
Firstpage :
254
Lastpage :
257
Abstract :
Semi-classical and quantum transport approaches are applied and compared to analyze the relative driving strength of nmos nanowires compared to FinFETs at 5nm design rules. Both transport approaches show better-than-expected nanowire drive current. The reason for this strong performance is explained in terms of electrostatic and subband structure effects. The impact of scattering on the fin to nanowire transition is also examined.
Keywords :
"Logic gates","Scattering","FinFETs","Nanoscale devices","Silicon","Quantum capacitance"
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN :
1946-1569
Print_ISBN :
978-1-4673-7858-1
Type :
conf
DOI :
10.1109/SISPAD.2015.7292307
Filename :
7292307
Link To Document :
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