DocumentCode :
3667969
Title :
Critical distance method for predicting the tail part of the threshold voltage distribution
Author :
Sungman Rhee;Seongwook Choi;YoungJune Park
Author_Institution :
School of Electrical Engineering and Computer Science, Seoul National University, Korea
fYear :
2015
Firstpage :
381
Lastpage :
384
Abstract :
As a source of the tail of the statistical distribution of MOSFET threshold voltage distributions, we identified how the potential chain extending from one width edge of the channel to the other width edge creates an abnormally large VT shift, using 3-D TCAD simulations. The critical distance between two adjacent fixed charges in a potential chain that is required to block the channel current has been identified, and its dependence on parameters has been verified. Using the critical distance, the probability of the occurrence of the worst case scenario, in which source to drain current is blocked by the potential chain, for 1 billion transistors has been predicted through percolation method.
Keywords :
"Doping","Probability","MOSFET","Electric potential","Logic gates","Threshold voltage"
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN :
1946-1569
Print_ISBN :
978-1-4673-7858-1
Type :
conf
DOI :
10.1109/SISPAD.2015.7292339
Filename :
7292339
Link To Document :
بازگشت