DocumentCode :
3668466
Title :
Greatly improved carrier injection in GaN-based VCSEL by multiple quantum barrier electron blocking layer
Author :
Dan-Hua Hsieh;An-Jye Tzou;Da-Wei Lin;Tsung-Sheng Kao;Chien-Chung Lin;Chun-Yen Chang;Hao-Chung Kuo
Author_Institution :
Department of Photonic &
fYear :
2015
Firstpage :
139
Lastpage :
140
Abstract :
In this report, the fabrication and characteristics of III-nitride based vertical-cavity surface-emitting laser (VCSEL) with bulk AlGaN and AlGaN/GaN superlattice electron blocking layer (EBL) are observed experimentally and theoretically. The results have been revealed that laser performance is improved by using superlattice EBL. The output power and the slope efficiency are enhanced by the improvement of carrier injection into active region. And the reduction of threshold current density from 10 to 8 kA/cm2 is also observed. Theoretical calculation results suggest that the improved carrier injection efficiency can be mainly attributed to the partial release of the strain at the interface of last quantum barrier and superlattice EBL and hence the increase of electrons and holes effective barrier height.
Keywords :
"Vertical cavity surface emitting lasers","Gallium nitride","Aluminum gallium nitride","Wide band gap semiconductors","Charge carrier processes","Superlattices","Threshold current"
Publisher :
ieee
Conference_Titel :
Numerical Simulation of Optoelectronic Devices (NUSOD), 2015 International Conference on
ISSN :
2158-3234
Print_ISBN :
978-1-4799-8378-0
Type :
conf
DOI :
10.1109/NUSOD.2015.7292861
Filename :
7292861
Link To Document :
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