DocumentCode :
36724
Title :
600 V Diamond Junction Field-Effect Transistors Operated at 200 ^{\\circ}{\\rm C}
Author :
Iwasaki, Takuya ; Yaita, Junya ; Kato, Haruhisa ; Makino, Tatsuya ; Ogura, M. ; Takeuchi, D. ; Okushi, H. ; Yamasaki, Shintaro ; Hatano, M.
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Tokyo, Japan
Volume :
35
Issue :
2
fYear :
2014
fDate :
Feb. 2014
Firstpage :
241
Lastpage :
243
Abstract :
Blocking characteristics of diamond junction field-effect transistors were evaluated at room temperature (RT) and 200 °C. A high source-drain bias (breakdown voltage) of 566 V was recorded at RT, whereas it increased to 608 V at 200 °C. The positive temperature coefficient of the breakdown voltage indicates the avalanche breakdown of the device. We found that the breakdown occurred at the drain edge of the p-n junction between p-channel and the n+-gates. All four devices measured in this letter showed a maximum gate-drain bias over 500 V at RT and 600 V at 200 °C.
Keywords :
avalanche breakdown; diamond; electric breakdown; junction gate field effect transistors; power semiconductor devices; avalanche breakdown; blocking characteristics; breakdown voltage; diamond junction field effect transistors; drain edge; high source drain bias; positive temperature coefficient; temperature 200 degC; voltage 566 V; voltage 608 V; Diamonds; Electric breakdown; JFETs; Logic gates; P-n junctions; Temperature; Temperature measurement; Diamond; JFETs; blocking characteristics; high temperature;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2294969
Filename :
6691915
Link To Document :
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