DocumentCode :
3677309
Title :
Heavily phosphorous-doped Germanium thin films for mid-infrared plasmonics
Author :
J. Frigerio;L. Baldassarre;E. Sakat;A. Samarelli;K. Gallacher;M. Fischer;D. Brida;D.J. Paul;G. Isella;P. Biagioni;M. Ortolani
Author_Institution :
L-Ness, Dipartimento di Fisica, Politecnico di Milano, Polo di Como, Como, Italy
fYear :
2015
Firstpage :
94
Lastpage :
95
Abstract :
Heavily doped Ge thin films grown on different substrates have been investigated by infrared (IR) reflectometry. Screened plasma frequency and losses have been determined to assess the possibilities and limitations of Ge for mid infrared plasmonic.
Keywords :
"Substrates","Reflectometry","Plasmons","Reflectivity"
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2015 IEEE 12th International Conference on
Type :
conf
DOI :
10.1109/Group4.2015.7305964
Filename :
7305964
Link To Document :
بازگشت