DocumentCode :
3677316
Title :
Development of silicon nitride arrayed waveguide grating by physical vapor deposition at room temperature
Author :
Papichaya Chaisakul;Ziyi Zhang;Moloki Yako;Delphine Marris-Morini;Laurent Vivien;Naoyuki Kawai;Kazumi Wada
Author_Institution :
Department of Materials Engineering, the University of Tokyo. Hongo 7-3-1 Bunkyo-ku, Tokyo 113-8656. Japan
fYear :
2015
Firstpage :
104
Lastpage :
105
Abstract :
We designed and fabricated SiN4-based AWG using physical vapor deposition technique at room temperature, compatible with low thermal budget over a wide application range. Preliminary results indicate filtering performances capable of dense WDM on a chip.
Keywords :
"Arrayed waveguide gratings","Silicon","Optical filters","Optical device fabrication","Optical crosstalk","Optical receivers"
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2015 IEEE 12th International Conference on
Type :
conf
DOI :
10.1109/Group4.2015.7305971
Filename :
7305971
Link To Document :
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