Experimental study of zinc oxide thin film fabricated by evaporation method

The aim of this work is to make a simplified thermal evaporation system for the fabrication of any kind of nanostructure thin film. Zinc thin film has been deposited on bare glass substrate by the proposed thermal evaporation system with 0.05 mbar pressure, 7000C source temperature and 10 minutes deposition time. For obtaining zinc oxide (ZnO) nanostructure thin film, the prepared zinc film is annealed at 5000C for 2 hours. The crystal structural, optical and surface morphological properties were investigated by x-ray diffraction (XRD), ultraviolet visible (UV) spectroscopy and scanning electron microscope (SEM) respectively. The prepared ZnO film has high crystalline wurtzite structure with uniform nanoporous structure. Optical band gap 3.00-3.14 eV which is suitable for the application of photocatalist of waste water cleaning and air purification.