DocumentCode :
3679144
Title :
Figure of Merits of 28nm Si Technologies for Implementing Laser Attack Resistant Security Dedicated Circuits
Author :
S. de Castro;G. Di Natale;M.-L. Flottes;B. Rouzeyre;J.-M. Dutertre
Author_Institution :
LIRMM, MIC, Montpellier, France
fYear :
2015
fDate :
7/1/2015 12:00:00 AM
Firstpage :
362
Lastpage :
367
Abstract :
Among all means to attack a security dedicated circuit, fault injection by means of laser illumination is a very efficient one. The laser beam creates electrons/holes pairs along its way through silicon. Collection of these charges creates a transient current and thus may induce a fault in the circuit. Nevertheless the collection efficiency depends on various parameters including the technology used to implement the circuit. Here, Bulk and Fully Depleted Silicon on Insulator (FD-SOI) 28nm technologies are compared in terms of sensitivity against laser injection. Laser induced current measurements are performed on a ST 28nm technology bulk and FDSOI NMOS transistors. It comes out that FD-SOI structures show less sensitivity to laser injection and thus should be further explored for security dedicated circuits implementations.
Keywords :
"Current measurement","Lighting","Junctions","Circuit faults","Laser beams","MOSFET"
Publisher :
ieee
Conference_Titel :
VLSI (ISVLSI), 2015 IEEE Computer Society Annual Symposium on
Type :
conf
DOI :
10.1109/ISVLSI.2015.76
Filename :
7309594
Link To Document :
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