• DocumentCode
    3679144
  • Title

    Figure of Merits of 28nm Si Technologies for Implementing Laser Attack Resistant Security Dedicated Circuits

  • Author

    S. de Castro;G. Di Natale;M.-L. Flottes;B. Rouzeyre;J.-M. Dutertre

  • Author_Institution
    LIRMM, MIC, Montpellier, France
  • fYear
    2015
  • fDate
    7/1/2015 12:00:00 AM
  • Firstpage
    362
  • Lastpage
    367
  • Abstract
    Among all means to attack a security dedicated circuit, fault injection by means of laser illumination is a very efficient one. The laser beam creates electrons/holes pairs along its way through silicon. Collection of these charges creates a transient current and thus may induce a fault in the circuit. Nevertheless the collection efficiency depends on various parameters including the technology used to implement the circuit. Here, Bulk and Fully Depleted Silicon on Insulator (FD-SOI) 28nm technologies are compared in terms of sensitivity against laser injection. Laser induced current measurements are performed on a ST 28nm technology bulk and FDSOI NMOS transistors. It comes out that FD-SOI structures show less sensitivity to laser injection and thus should be further explored for security dedicated circuits implementations.
  • Keywords
    "Current measurement","Lighting","Junctions","Circuit faults","Laser beams","MOSFET"
  • Publisher
    ieee
  • Conference_Titel
    VLSI (ISVLSI), 2015 IEEE Computer Society Annual Symposium on
  • Type

    conf

  • DOI
    10.1109/ISVLSI.2015.76
  • Filename
    7309594