DocumentCode :
3683413
Title :
System of remote access to nanotechnology facility “Nanofab-100” for design UHF electronics
Author :
Kirill K. Lavrentyev;Vladimir K. Nevolin;Roman Yu. Rozanov;Konstantin A. Tsarik
Author_Institution :
National Research University of Electronic Technology, Moscow, Russia
fYear :
2015
Firstpage :
165
Lastpage :
168
Abstract :
A remote access to nanotechnology facility “Nanofab- 100” allows to remotely manage the creation and investigation of structures of electronic devices with nanoscale elements, in particular, high-power microwave HEMT-transistors based on nitride heterostructures and surface acoustic wave sensors and to develop technological routes of manufacturing thereof. Students from different countries will be able to learn nanotechnology remotely using the educational complex “Nanofab Online”. This system allows remote access to researchers and students (bachelors and masters) for study the processes of molecular beam epitaxy (MBE), focused ion beam (FIP) and the methods of scanning probe microscopy (AFM).
Keywords :
"Nanotechnology","Lithography","Electron microscopy","Etching"
Publisher :
ieee
Conference_Titel :
Internet Technologies and Applications (ITA), 2015
Print_ISBN :
978-1-4799-8036-9
Type :
conf
DOI :
10.1109/ITechA.2015.7317389
Filename :
7317389
Link To Document :
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