DocumentCode :
3688031
Title :
Sol-gel imprint lithography for guided mode resonance structures
Author :
Yin Huang;Longju Liu;Benjamin Ch´ng;Meng Lu
Author_Institution :
Department of Electrical and Computer Engineering, Iowa State University, Ames, 50011, USA
fYear :
2015
Firstpage :
367
Lastpage :
368
Abstract :
A sol-gel based imprint lithography process has been developed to fabricate guided-mode resonance (GMR) structures. The inexpensive process offers a rapid means to create sub-micron grating waveguide structures over large surface areas. Both one-dimensional and two-dimensional GMR devices have been successfully fabricated and characterized.
Keywords :
"Optical device fabrication","Glass","Dielectrics","Optical waveguides","Gratings"
Publisher :
ieee
Conference_Titel :
Photonics Conference (IPC), 2015
ISSN :
1092-8081
Type :
conf
DOI :
10.1109/IPCon.2015.7323457
Filename :
7323457
Link To Document :
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