DocumentCode :
3689784
Title :
Nanocarbon interconnects: Demonstration of properties better than Cu and remaining issues
Author :
Shintaro Sato
Author_Institution :
Fujitsu Laboratories Ltd, 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
fYear :
2015
fDate :
5/1/2015 12:00:00 AM
Firstpage :
313
Lastpage :
316
Abstract :
Nanocarbon materials including graphene and carbon nanotubes (CNTs) are promising candidates for future LSI interconnects. We recently demonstrated sub-10-nm-wide graphene interconnects whose resistivity is lower than that of Cu with similar dimensions. In this paper, we first describe the fabrication and evaluation of such graphene interconnects. We then explain a newly-developed fabrication process for carbon nanotube (CNT) vias and plugs, which relies on implantation of CNTs into sub-micrometer-sized holes. We then point out further issues to be addressed for realizing nanocarbon interconnects.
Keywords :
"Plugs","Conductivity","Graphene","Films","Fabrication","Substrates","Lithography"
Publisher :
ieee
Conference_Titel :
Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
ISSN :
2380-632X
Electronic_ISBN :
2380-6338
Type :
conf
DOI :
10.1109/IITC-MAM.2015.7325589
Filename :
7325589
Link To Document :
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