Title :
Stability of GeTe-based phase change material stack under thermal stress: Reaction with Ti studied by combined in-situ x-ray diffraction, sheet resistance and atom probe tomography
Author :
Dominique Mangelinck;Magali Putero;Marion Descoins;Carine Perrin-Pellegrino
Author_Institution :
IM2NP, CNRS, Aix-Marseille Université
fDate :
5/1/2015 12:00:00 AM
Abstract :
In situ sheet resistance and x-ray diffraction measurements were used simultaneously during heat treatment to study Ti electrodes in contact with Ge-Te phase change materials. Ti is found to react with GeTe forming TiTe2 and Ge. Atom probe tomography analyses confirm the presence of these two phases after a 400°C heat treatment.
Keywords :
"Temperature measurement","Tin","Probes","Electrical resistance measurement","X-ray scattering","Phase change materials","Atomic measurements"
Conference_Titel :
Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
Electronic_ISBN :
2380-6338
DOI :
10.1109/IITC-MAM.2015.7325629
