• DocumentCode
    3689827
  • Title

    Cobalt compatible cleaning solutions for 14nm and beyond

  • Author

    Kristell Courouble;Lucile Broussous;Stephane Zoll;Katia Haxaire;Maxime Mellier;Gael Druais

  • Author_Institution
    STMicroelectronics, 850 rue Jean Monnet, F-38926 Crolles, France
  • fYear
    2015
  • fDate
    5/1/2015 12:00:00 AM
  • Firstpage
    119
  • Lastpage
    122
  • Abstract
    In this paper, wet cleaning solution compatible with cobalt are investigated to achieve low Co etching rate on blankets film and no film attack on patterned 14nm wafer after line and via etching. Proposed solutions are compared to conventional wet cleaning solutions.
  • Keywords
    "Cobalt","Cleaning","Etching","Copper","Films","Corrosion","Temperature measurement"
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
  • ISSN
    2380-632X
  • Electronic_ISBN
    2380-6338
  • Type

    conf

  • DOI
    10.1109/IITC-MAM.2015.7325635
  • Filename
    7325635
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3689827