Title :
Cobalt compatible cleaning solutions for 14nm and beyond
Author :
Kristell Courouble;Lucile Broussous;Stephane Zoll;Katia Haxaire;Maxime Mellier;Gael Druais
Author_Institution :
STMicroelectronics, 850 rue Jean Monnet, F-38926 Crolles, France
fDate :
5/1/2015 12:00:00 AM
Abstract :
In this paper, wet cleaning solution compatible with cobalt are investigated to achieve low Co etching rate on blankets film and no film attack on patterned 14nm wafer after line and via etching. Proposed solutions are compared to conventional wet cleaning solutions.
Keywords :
"Cobalt","Cleaning","Etching","Copper","Films","Corrosion","Temperature measurement"
Conference_Titel :
Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
Electronic_ISBN :
2380-6338
DOI :
10.1109/IITC-MAM.2015.7325635
