Title :
Contribution of molecular simulation to the characterization of porous low-k materials
Author :
° Lucile Broussous;Matthieu Lépinay;Benoit Coasne;Christophe Licitra;François Bertin;Vincent Rouessac;André Ayral
Author_Institution :
STMicroelectronics, 850, rue Jean Monnet, 38926 Crolles cedex, France
fDate :
5/1/2015 12:00:00 AM
Abstract :
This study aims to investigate the modified surface porosity of SiOCH low-k porous thin films using statistical mechanics molecular simulations and ellipso-porosimetry. The thin films are modified by plasma etching and wet cleaning. Numerical simulations of solvent adsorption on surfaces highlighted solvent affinity variations depending on chemical surface compositions.
Keywords :
"Adsorption","Methanol","Silicon compounds","Solvents","Surface treatment","Chemicals","Probes"
Conference_Titel :
Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
Electronic_ISBN :
2380-6338
DOI :
10.1109/IITC-MAM.2015.7325636
