Title :
Demonstration of new planar capacitor (PCAP) vehicles to evaluate dielectrics and metal barrier thin films
Author :
Kevin L. Lin;Jeffrey Bielefeld;Jasmeet S. Chawla;Colin T. Carver;Ramanan Chebiam;James S. Clarke;Jacob Faber;Michael Harmes;Tejaswi Indukuri;Christopher Jezewski;Rahim Kasim;Mauro Kobrinsky;Nafees A. Kabir;Brian Krist;Narendra Lakamraju;Hazel Lang;Ebony M
Author_Institution :
Components Research, Intel Corporation, 5200 NE Elam Young Pkwy, Hillsboro, Oregon, 97124 USA
fDate :
5/1/2015 12:00:00 AM
Abstract :
Planar capacitors can quickly test material properties of metals and dielectrics for interconnects. A sidewall capacitor device is used to evaluate metal thin-film barriers. Etch stop planar capacitors in turn can test multi-layer etch stops, exposing differences between leaky and good etch stop films. Fillable planar capacitors are also fabricated and results presented for that class of fill materials.
Keywords :
"MIMICs","DH-HEMTs","Capacitors","Dielectric breakdown","Copper"
Conference_Titel :
Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
Electronic_ISBN :
2380-6338
DOI :
10.1109/IITC-MAM.2015.7325646
