• DocumentCode
    3689838
  • Title

    Demonstration of new planar capacitor (PCAP) vehicles to evaluate dielectrics and metal barrier thin films

  • Author

    Kevin L. Lin;Jeffrey Bielefeld;Jasmeet S. Chawla;Colin T. Carver;Ramanan Chebiam;James S. Clarke;Jacob Faber;Michael Harmes;Tejaswi Indukuri;Christopher Jezewski;Rahim Kasim;Mauro Kobrinsky;Nafees A. Kabir;Brian Krist;Narendra Lakamraju;Hazel Lang;Ebony M

  • Author_Institution
    Components Research, Intel Corporation, 5200 NE Elam Young Pkwy, Hillsboro, Oregon, 97124 USA
  • fYear
    2015
  • fDate
    5/1/2015 12:00:00 AM
  • Firstpage
    139
  • Lastpage
    142
  • Abstract
    Planar capacitors can quickly test material properties of metals and dielectrics for interconnects. A sidewall capacitor device is used to evaluate metal thin-film barriers. Etch stop planar capacitors in turn can test multi-layer etch stops, exposing differences between leaky and good etch stop films. Fillable planar capacitors are also fabricated and results presented for that class of fill materials.
  • Keywords
    "MIMICs","DH-HEMTs","Capacitors","Dielectric breakdown","Copper"
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
  • ISSN
    2380-632X
  • Electronic_ISBN
    2380-6338
  • Type

    conf

  • DOI
    10.1109/IITC-MAM.2015.7325646
  • Filename
    7325646
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3689838