DocumentCode :
3689859
Title :
Carbon nanotubes TSV grown on an electrically conductive ZrN support layer
Author :
Sten Vollebregt;Sourish Banerjee;Frans D. Tichelaar;Ryoichi Ishihara
Author_Institution :
Delft University of Technology, Faculty of Electrical Engineering, Computer Science and Mathemathics, Department of Microelectronics, Laboratory of Electronic Components, Technology and Materials
fYear :
2015
fDate :
5/1/2015 12:00:00 AM
Firstpage :
281
Lastpage :
284
Abstract :
Carbon nanotubes (CNT) are an attractive alternative filler material for through silicon vias (TSV) due to their high aspect ratio, attractive mechanical and thermal properties and high current carrying capability. Theoretically they can outperform Cu in terms of via resistance. Until now all CNT TSV reported in the literature were fabricated using electrically isolating catalyst support layers. In this work we demonstrate the growth of CNT with aspect ratios up to 35 on electrically conductive ZrN layers. This was used to fabricate the first CNT TSV which are directly contacted by metal thin-films on both sides of the CNT bundle, instead of resorting to the use of probe needles.
Keywords :
"Silicon","Conductivity","Carbon nanotubes","Probes","Contact resistance","Iron"
Publisher :
ieee
Conference_Titel :
Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
ISSN :
2380-632X
Electronic_ISBN :
2380-6338
Type :
conf
DOI :
10.1109/IITC-MAM.2015.7325667
Filename :
7325667
Link To Document :
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